Full-spectrum
materials characterization.
Six capabilities. Applied where they matter. From atomic-scale trace detection to surface chemistry and depth profiling — We select the right analytical approach for your development challenge — and interpret every result in context.
The gold standard for trace elemental analysis — with no sample preparation.
Neutron Activation Analysis is a highly sensitive nuclear technique for measuring trace impurities in environmental, biological, geological, organic, and polymeric materials. Its fundamental advantage: the technique is based entirely on nuclear properties, making it completely independent of the chemical state of the elements.
Samples and comparator standards — including NIST reference materials — are irradiated in a neutron field such as a research reactor. During irradiation, elements present in the sample become radioactive, each emitting unique gamma rays with characteristic energies. A germanium detector counts these gamma rays and generates a spectrum from which element concentrations are determined with ±1% relative precision.
Unlike solution-based techniques such as ICP-MS, NAA requires no sample dissolution — making it the only practical choice for polymeric contact lens materials, insoluble ceramics, and bulk solid specimens where wet chemistry would destroy the sample or introduce contamination.
For extraction and leaching studies, the Ag-110m radiotracer method enables highly elegant experimental designs: irradiate the sample once, record the baseline activity, immerse in saline or any chosen medium, then measure the reduction in count rate to determine exact percentage loss — to a very low level of removal.
Surface chemistry and chemical bonding state — simultaneously.
X-Ray Photoelectron Spectroscopy probes the outermost 5–10 nanometers of a material surface, providing binding energy data that identifies the chemical state of every element present. XPS distinguishes between metallic silver and oxidized silver, between elemental carbon and oxygenated hydrocarbon — providing information that bulk analysis cannot reveal.
All species can be quantified and expressed as atomic percent, giving a complete picture of surface composition and chemistry. Changes in hydrocarbon composition appear in carbon binding energy shifts; excess hydration or dehydration is measured via oxygen content; organometallic signatures provide insight into bonding mechanisms.
XPS data also provides a critical foundation for advanced Synchrotron analysis when deeper investigation is required — establishing the baseline chemical state before more specialized techniques are applied.
EDS
High-resolution imaging paired with elemental identity — in the same measurement.
Scanning Electron Microscopy provides high-resolution surface and cross-sectional imaging from the nanometer to micrometer scale, revealing morphology, grain structure, porosity, and defect features invisible to optical microscopy. When combined with Energy Dispersive Spectroscopy, SEM becomes a simultaneous imaging and elemental mapping system.
EDS generates characteristic X-rays from the sample that identify which elements are present and where — producing elemental maps that show spatial distribution of every detectable species across the field of view. This combination is particularly powerful for failure analysis, contamination investigation, and coating evaluation, where knowing both the visual structure and the chemical composition of a feature is essential.
Depth profiling from the surface into the bulk — with elemental specificity.
Secondary Ion Mass Spectrometry sputters the material surface with an ion beam, ejecting secondary ions that are mass-analyzed to provide elemental and isotopic composition as a function of depth. SIMS can extend depth profiling measurements to 20–30 microns — far deeper than XPS — while maintaining sensitivity to trace concentrations.
SIMS is the technique of choice when the distribution of an element or dopant through a coating, film, or near-surface region is the critical question. It provides both quantified and relative depth distribution profiles, making it essential for semiconductor device analysis, thin film characterization, and diffusion studies.
Non-destructive near-surface composition — to a few microns depth.
Rutherford Backscattering Spectrometry uses high-energy helium ions directed at the sample surface. The energy of backscattered ions is analyzed to yield quantitative elemental composition and depth profiles from the surface to a few microns — without damaging the sample.
RBS is particularly effective for heavy element detection in light matrices, thin film thickness measurement, and stoichiometry determination in compound semiconductors and ceramic coatings. When combined with SIMS for deeper profiling, the two techniques provide a complementary picture of the near-surface and mid-depth composition of any material system.
Ultra-trace elemental detection in solution — down to parts per trillion.
Inductively Coupled Plasma Mass Spectrometry is the premier solution-based technique for multi-element trace analysis, capable of detecting most elements at parts-per-billion to parts-per-trillion concentrations. Dissolved samples are introduced into a high-temperature plasma that ionizes the elements, which are then separated and detected by mass spectrometry.
ICP-MS provides quantitative analysis for a broad range of elements simultaneously, making it highly efficient for screening and compliance applications. For samples that can be dissolved — metals, alloys, water, environmental matrices, biological fluids — ICP-MS delivers unmatched sensitivity and throughput. For insoluble materials such as polymers and ceramics, NAA is the preferred alternative.
-MS
Which technique is right for your application?
This guide maps common development and analytical questions to the most appropriate technique. Contact SAMI to discuss which capabilities fit your development challenge.
| Technique | Bulk analysis | Surface analysis | Depth profiling | No sample prep | Best for |
|---|---|---|---|---|---|
| NAA | ✓ | — | — | ✓ | Trace elements in polymers, ceramics, biologicals |
| XPS | — | ✓ | Shallow | ✓ | Chemical bonding state, surface chemistry, coatings |
| SEM/EDS | — | ✓ | — | ✓ | Imaging + elemental mapping, failure analysis |
| SIMS | — | ✓ | ✓ | — | Depth profiles to 20–30 µm, dopant distribution |
| RBS | — | ✓ | ✓ | ✓ | Near-surface, thin films, non-destructive profiling |
| ICP-MS | ✓ | — | — | — | Ultra-trace metals in solution, environmental, biologicals |